MF MEGNETRON SPUTTERING COATING EQUIPMENT IN INDIA

MF sputtering technique has become the mainstream technology of sputtering, what characterstics superior to the DC sputtering are: 1. Overcome the phenomenon of anode disappearance. 2. Reduce or eliminate the abnormal arc discharge of target, therrefore, improving the stability of sputtering process technology, while incleasing the deposition rate of dielectric coating. Our company R&D plane target, cylindrical target, twin target, opposite target and various structures of MF sputtering targets. it is widely used in watchband, watchcases, mobile shell, hard wares, tableware etc. it can deposit TiN, TiCN, TiAIN, CrN etc decorative coating.